| Preface List of Contributors Chapter 1 Review of Advances in Processing Methods: Films and Nanocrystalline Powders Kwang-Leong Choy Chapter 2 Process Principles and Applications of Novel and Cost-Effective ESAVD Based Methods Kwang-Leong Choy 1. Background 2. Fundamental of ESAVD 2.1. Definition 2.2. Process Principles 2.3. Process Parameters 2.4. Electrostatic Atomisation and Spraying 2.5. Electrical Field 2.6. Thermal Field 2.7. Microstructure of ESAVD Deposits 2.8. Advantages 2.9. Comparison of ESAVD with Other Electrospraying Techniques 2.10. Applications 3. Case Studies 3.1. ESAVD of ThickFilms 3.2. ESAVD of Thin Films 3.3. Other Variants of ESAVD 4. Conclusions and Outlook Acknowledgements References Chapter 3 Application of Pulsed Injection MOCVD to the Deposition of Oxide Single Layers and Superlattices Jean-Pierre Sdnateur, Catherine Dubourdieu, V. Galindo, Franqois Weiss and Adolfas Abrutis 1. Introduction 2. Deposition of Oxide Films from the Metal-Organic Vapour Phase 3. Experimental Set-up and Characterisation 4. Results 4.1. Oxide Films Grown by Pulsed Injection CVD 4.2. Oxide Multilayered Structures Deposited by Pulsed Injection CVD.. 5. Conclusions References Chapter 4 Novel Synthesis Nanocrystalline Diamond Films Stanislaw Mitura 1. Introduction 2. Experimental 2.1. Nucleation of Diamond Particles 2.2. Synthesis of Nanocrystalline Diamond Coatings 3. Characterisation 3.1. Structural Investigations 3.2. Characterisation of the Raman Spectra 3.3. AES and Micro X-ray Investigations of Substrate/Film Interface 3.4. Tribological Investigations 3.5. Corrosion Resistance 4. Medical Applications 4.1. Pre-clinic Investigation 4.2. Examples in Medicine 5. Mechanical Applications 6. Applications in Jewellery 7. Conclusions References Acknowledgements …… Index |
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