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Fundamentals of Electrochemical Deposition, 2nd Edition电化学沉积导论

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Fundamentals of Electrochemical Deposition, 2nd Edition电化学沉积导论

最 低 价：￥718.50

定 价：￥958.00

作 者：Milan, PhD Paunovic，Mordechay, PhD Schlesinger　著 著

出 版 社：吉林长白山

出版时间：2006-8-1

I S B N：9780471712213

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    内容简介
    Excellent teaching and resource material，it is concise， coherently structured， and easy to read，highly recommended for students， engineers， and researchers in all related fields。
    -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition
    　　From computer hardware to automobiles，medical diagnostics to aerospace， electrochemical deposition plays a crucial role in an array of key industries。 Fundamentals of Electrochemical Deposition，Second Edition is a comprehensive introduction to one of today’s most exciting and rapidly evolving fields of practical knowledge。
    　　The most authoritative introduction to the field so far， the book presents detailed coverage of the full range of electrochemical deposition processes and technologies， including:
    　　* Metal-solution interphase
    　　* Charge transfer across an interphase
    　　* Formation of an equilibrium electrode potential
    　　* Nucleation and growth of thin films
    　　* Kinetics and mechanisms of electrodeposition
    　　* Electroless deposition
    　　* In situ characterization of deposition processes
    　　* Structure and properties of deposits
    　　* Multilayered and composite thin films
    　　* Interdiffusion in thin film
    　　* Applications in the semiconductor industry and the field of medicine
    　　This new edition updates the prior edition to address the new developments in the science and its applications，with new chapters on innovative applications of electrochemical deposition in semiconductor technology， magnetism and microelectronics，and medical instrumentation。Added coverage includes such topics as binding energy，nanoclusters，atomic force，and scanning tunneling microscopy。Example problems at the end of chapters and other features clarify and improve understanding of the material。
    　　Written by an author team with extensive experience in both industry and academe，this reference and text provides a well-rounded introduction to the field for students，as well as a means for professional chemists， engineers， and technicians to expand and sharpen their skills in using the technology。

    作者简介

    目录
    Preface to the Second Edition
    Preface to the First Edition
    1　Overview
    2　Water and Ionic Solutions
    3　Metals and Metal Sufaces
    4　Metal-Solution Interphase
    5　Equilibrium Electrode Potential
    6　Kinetics and Mechanism of Electrodeposition
    7　Nucleation and Growth Models
    8　Electroless Deposition
    9　Displacement Deposition
    10　Effect of Additives
    11　Electrodeposition of Alloys
    12　Metal Deposit and Current Distribution
    13　Characterization of metallic Surfaces and Thin Films
    14　In Situ Characterization of Deposition
    15　Mathematical Modeling in Electrochemistry
    16　Structure anad Properties of Deposits
    17　Electrodeposited Multilayers
    18　Interdiffusion in Thin Films
    19　Applications in Semiconductors Technology
    20　Applications in the Fields of Magnetism and Microelectronics
    21　Frontiers in Applications: Applications in the Field of Medicine
    Index.

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